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Pattern transfer and photoluminescence damage assessment of deep-submicrometer features etched by photon-induced cryoetching
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Applied Physics A-Materials Science & Processing Vol.63, pp143-151 (1996)
M.B. Freiler, M.C. Shih, S. Kim, M. Levy, I.P. Herman, R. Scarmozzino, R.M. Osgood, Jr.